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Proceedings Paper

Performance of i- and g-line phase-shift measurement system MPM-100
Author(s): Hiroshi Fujita; Hisatake Sano; Haruhiko Kusunose; Hideo Takizawa; Kouji Miyazaki; Naoki Awamura; Takahiro Ode; Daikichi Awamura
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Paper Abstract

The performance of an i-/g-line direct-phase measurement system Lasertec MPM- 100 has been evaluated. The minimum measurable pattern sizes is 2.5 .μm for holes on an 8%-i-line transmittance halftone phase shift masks (HPSMs). The effect of the focus position is not significant for hole pattern of above 3.5 μm. Both short-term repeatability and long-term stability are excellent, being less than 0.5 deg. The effect of the illumination NA has been investigated theoretically and experimentally, and the use of correction factors based on experiment is proposed for estimating effective phase shifts from phase shifts obtained by MPM- 100.

Paper Details

Date Published: 24 July 1996
PDF: 16 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245227
Show Author Affiliations
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)
Haruhiko Kusunose, Lasertec Corp. (Japan)
Hideo Takizawa, Lasertec Corp. (Japan)
Kouji Miyazaki, Lasertec Corp. (Japan)
Naoki Awamura, Lasertec Corp. (Japan)
Takahiro Ode, Lasertec Corp. (Japan)
Daikichi Awamura, Lasertec Corp. (Japan)


Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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