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Proceedings Paper

Recent progress in repair accuracy of the focused ion-beam mask repair system
Author(s): Kazuo Aita; Anto Yasaka; Tadashi Kitamura; Hiroshi Matsumura; Yasushi Satoh; Hiroshi Nakamura; Junji Fujikawa; Katsuhide Tsuchiya; Shigeru Noguchi
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Paper Abstract

To improve the depth of focus (DOF) of isolated lines, attenuated assist feature (AAF) technique has been proposed; AAFs having more than 20% transmittance were located around an isolated line. In this mask, the transmittance and phase shift angle of AAF as well as its position and width have effects on lithographic performance. In particular, the phase shift angle has strong effect on focus latitude. The performances of two AAF masks (65% transmittance/28 degree phase shift and 40% transmittance/54 degree phase shift) were evaluated by using an NA equals 0.6, sigma- in)/(sigma) out equals 0.42/0.7, i-line stepper. The focus latitude of 0.3 micrometer isolated line became flat around the best focus position with 28 degree phase shift AAFs. In conclusion, we can obtain wide DOF for isolated lines by selecting optimum phase shift angle of AAF.

Paper Details

Date Published: 24 July 1996
PDF: 12 pages
Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245221
Show Author Affiliations
Kazuo Aita, Seiko Instruments Inc. (Japan)
Anto Yasaka, Seiko Instruments Inc. (Japan)
Tadashi Kitamura, Seiko Instruments Inc. (Japan)
Hiroshi Matsumura, Seiko Instruments Inc. (Japan)
Yasushi Satoh, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Nakamura, Dai Nippon Printing Co., Ltd. (Japan)
Junji Fujikawa, Dai Nippon Printing Co., Ltd. (Japan)
Katsuhide Tsuchiya, Dai Nippon Printing Co., Ltd. (Japan)
Shigeru Noguchi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 2793:
Photomask and X-Ray Mask Technology III
Hideo Yoshihara, Editor(s)

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