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Proceedings Paper

EUV spectrometric facility with laser-focus plasma radiation source
Author(s): Valeri O. Papanyan; Gagik Ts. Nersisyan
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Paper Abstract

A spectrometric facility for measurements of reflection, absorption and excitation spectra of films and massive samples in 50 to 300 nm wavelength region with the spectral resolution up to 103 is designed and tested. Plasma produced EUV radiation from the laser beam focused onto a gaseous or a solid target makes it possible to achieve the spectral intensity on a sample up to 3(DOT)106 photons/s(DOT)cm-1. Application to measurement of reflection spectra of some phthalocynines is reported here.

Paper Details

Date Published: 19 July 1996
PDF: 5 pages
Proc. SPIE 2805, Multilayer and Grazing Incidence X-Ray/EUV Optics III, (19 July 1996); doi: 10.1117/12.245103
Show Author Affiliations
Valeri O. Papanyan, Institute for Physical Research (Armenia)
Gagik Ts. Nersisyan, Institute for Physical Research (Armenia)

Published in SPIE Proceedings Vol. 2805:
Multilayer and Grazing Incidence X-Ray/EUV Optics III
Richard B. Hoover; Arthur B. C. Walker, Editor(s)

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