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Proceedings Paper

Double multilayer monochromator for harmonic rejection in the 5-to60-keV range
Author(s): Manohar Lingham; Eric Ziegler; Eike Luken; Paul W. Loeffen; Stefan Muellender; Jose Goulon
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Paper Abstract

A W/Si double multilayer monochromator has been installed on the ESRF BM29 (multipurpose XAFS) beamline with the specific task of suppressing higher order harmonics from the synchrotron x-rays of a bending magnet. This novel technique uses an identical pari of multilayers which were deposited by a method based on distributed electron cyclotron resonance plasma sputtering. In situ growth monitoring enabled the clear identification of a WSi chemical interface with an approximate width of 1nm: the relative size of the interface was found to severely limit the ability of the multilayer to completely reject specific harmonics. In total, the monochromator enabled suppression of all higher order harmonics to less than six orders of magnitude with an approximately 30 percent throughput in the first Bragg peak (at 8 keV). The use of such a multilayer monochromator for harmonic rejection in tandem with a crystal monochromator replaces the traditional method of deploying large grazing incidence mirrors; particular advantages for the multilayers are the significant reduction in size and cost.

Paper Details

Date Published: 19 July 1996
PDF: 11 pages
Proc. SPIE 2805, Multilayer and Grazing Incidence X-Ray/EUV Optics III, (19 July 1996); doi: 10.1117/12.245090
Show Author Affiliations
Manohar Lingham, European Synchrotron Radiation Facility (France)
Eric Ziegler, European Synchrotron Radiation Facility (France)
Eike Luken, European Synchrotron Radiation Facility (France)
Paul W. Loeffen, European Synchrotron Radiation Facility (France)
Stefan Muellender, European Synchrotron Radiation Facility (France)
Jose Goulon, European Synchrotron Radiation Facility (France)


Published in SPIE Proceedings Vol. 2805:
Multilayer and Grazing Incidence X-Ray/EUV Optics III
Richard B. Hoover; Arthur B. C. Walker, Editor(s)

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