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Proceedings Paper

Integrated optical channel waveguides in silicon using SiGe alloys
Author(s): Armin O. Splett; Joachim Schmidtchen; Berndt Schueppert; Klaus Petermann
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Paper Abstract

Different techniques for fabrication of single-mode waveguides in silicon by etching and indiffusion are reported. Minimum propagation losses around 3dB/cm at a wavelength of 1. 3Lm have been achieved.

Paper Details

Date Published: 1 February 1991
PDF: 7 pages
Proc. SPIE 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications, (1 February 1991); doi: 10.1117/12.24472
Show Author Affiliations
Armin O. Splett, Technische Univ. Berlin (Germany)
Joachim Schmidtchen, Technische Univ. Berlin (Germany)
Berndt Schueppert, Technische Univ. Berlin (Germany)
Klaus Petermann, Technische Univ. Berlin (Germany)


Published in SPIE Proceedings Vol. 1362:
Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications

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