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Proceedings Paper

Growth and properties of YBCO thin films by metal-organic chemical vapor deposition and plasma-enhanced MOCVD
Author(s): Jing-Fu Zhao; Y. Q. Li; Chyi Shyuan Chern; Wei-Feng Huang; Peter E. Norris; B. M. Gallois; B. H. Kear; P. Lu; G. A. Kulesha; F. Cosandey
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Paper Details

Date Published: 1 February 1991
PDF: 9 pages
Proc. SPIE 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications, (1 February 1991); doi: 10.1117/12.24457
Show Author Affiliations
Jing-Fu Zhao, EMCORE Corp. (United States)
Y. Q. Li, Stevens Institute of Technology (United States)
Chyi Shyuan Chern, Rutgers Univ. (United States)
Wei-Feng Huang, Rutgers Univ. (United States)
Peter E. Norris, EMCORE Corp. (United States)
B. M. Gallois, Stevens Institute of Technology (United States)
B. H. Kear, Rutgers Univ. (United States)
P. Lu, Rutgers Univ. (United States)
G. A. Kulesha, Stevens Institute of Technology (United States)
F. Cosandey, Rutgers Univ. (United States)


Published in SPIE Proceedings Vol. 1362:
Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications

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