Share Email Print
cover

Proceedings Paper

New materials for high-performance III-V ICs and OEICs: an industrial approach
Author(s): Gerard Maric Martin; Peter M. Frijlink
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

High performance IC''s and OEIC''s rely on complex epitaxial heterostructures with tight bandgap engineering. Related developmentandproduction requires notonly very homogeneous materials but manufacturing ofqualified batches of similar wafers. Furthermore in most cases critical feature size of devices is submicronic which puts forward another important requirementconcerning surface contamination ofwafers. Thispaperpresents the breakthrough we have achieved in the above fields using especially the novel MOVPE multiwafer PLANET reactor.

Paper Details

Date Published: 1 February 1991
PDF: 8 pages
Proc. SPIE 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications, (1 February 1991); doi: 10.1117/12.24446
Show Author Affiliations
Gerard Maric Martin, Labs. d'Electronique Philips (France)
Peter M. Frijlink, Labs. d'Electronique Philips (France)


Published in SPIE Proceedings Vol. 1362:
Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications
Manijeh Razeghi, Editor(s)

© SPIE. Terms of Use
Back to Top