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Proceedings Paper

Photoresist technology for 0.25-um lithography
Author(s): Will Conley
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Paper Details

Date Published: 5 July 1996
PDF: 40 pages
Proc. SPIE TTS5, Microlithography in Manufacturing Technology, (5 July 1996); doi: 10.1117/12.244362
Show Author Affiliations
Will Conley, IBM Microelectronics (United States)

Published in SPIE Proceedings Vol. TTS5:
Microlithography in Manufacturing Technology

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