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Proceedings Paper

Reactive ion etching of InP and its optical assessment
Author(s): Roderick W. MacLeod; Cliva M. Sotomayor-Torres; Manijeh Razeghi; C. R. Stanley; Chris D. W. Wilkinson
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Paper Details

Date Published: 1 March 1991
PDF: 6 pages
Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); doi: 10.1117/12.24418
Show Author Affiliations
Roderick W. MacLeod, Univ. of Glasgow (United Kingdom)
Cliva M. Sotomayor-Torres, Univ. of Glasgow and Thomson-CSF (Germany)
Manijeh Razeghi, Thomson-CSF (United States)
C. R. Stanley, Univ. of Glasgow (United Kingdom)
Chris D. W. Wilkinson, Univ. of Glasgow (United Kingdom)


Published in SPIE Proceedings Vol. 1361:
Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization

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