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Proceedings Paper

Current trends and issues for low-damage dry etching of optoelectronic devices
Author(s): Evelyn L. Hu
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Paper Details

Date Published: 1 March 1991
PDF: 11 pages
Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); doi: 10.1117/12.24377
Show Author Affiliations
Evelyn L. Hu, Univ. of California/Santa Barbara (United States)


Published in SPIE Proceedings Vol. 1361:
Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization

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