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Proceedings Paper

Near-UV laser ablation of doped polymers
Author(s): Juergen Ihlemann; Matthias Bolle; Klaus Luther; Juergen Troe
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Paper Abstract

Near UV excimer ablation of transparent polymers can be improved or even enabled by doping using organic dyes. Polymethylmethacrylate (PMMA) and polystyrene (PS) have been investigated using both photostable and photoreactive dopants. The best results with regard to etch quality and effectivity have been achieved with 1,3- diphenyltriazene, which supports the ablation process by photoeliminating nitrogen. Etch rates of 50 jim/pulse can be reached at 308 nm and 351 nra. The etch rate does not depend entirely on the low level absorption coefficient of the doped polymer.

Paper Details

Date Published: 1 March 1991
PDF: 9 pages
Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); doi: 10.1117/12.24328
Show Author Affiliations
Juergen Ihlemann, Laser-Lab. Goettingen eV (Germany)
Matthias Bolle, Laser-Lab. Goettingen eV (Germany)
Klaus Luther, Univ. Goettingen (Germany)
Juergen Troe, Univ. Goettingen (Germany)


Published in SPIE Proceedings Vol. 1361:
Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization

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