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Proceedings Paper

Free volume variations during exposure and PEB of DUV positive resists: effect on dissolution properties
Author(s): Laurent Pain; Charles Le Cornec; Charles Rosilio; Patrick Jean Paniez
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Paper Abstract

The influence of extra free volume content, generated during spin-coating, on the lithographic performance of DUV chemically amplified positive resists has been reported in several papers. During exposure and PEB, the deprotection reaction, together with the evolution of the protecting group, constitute a new source of free volume. As investigated in this study, in addition to the chemical modifications resulting from the deprotection reaction, the free volume content, and its variations during PEB, may affect the dissolution properties of the exposed areas.

Paper Details

Date Published: 14 June 1996
PDF: 10 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241878
Show Author Affiliations
Laurent Pain, France Telecom/CNET (France)
Charles Le Cornec, LETI/CEA (France)
Charles Rosilio, CEA-CEN/S (France)
Patrick Jean Paniez, France Telecom/CNET (France)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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