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Proceedings Paper

High-throughput process optimization using the EZ technique
Author(s): Medhat A. Toukhy; Karin R. Schlicht; Patricia Morra; Somboun Chanthalyma
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Paper Abstract

The greatest advantage of the EZ method is that it provides a simple, rapid and reliable technique to screen and evaluate the lithographic process. Thorough lithographic and dissolution rate examination can be performed for only the final selections of resist materials and process.

Paper Details

Date Published: 14 June 1996
PDF: 10 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241863
Show Author Affiliations
Medhat A. Toukhy, Olin Microelectronic Materials (United States)
Karin R. Schlicht, Olin Microelectronic Materials (United States)
Patricia Morra, Olin Microelectronic Materials (United States)
Somboun Chanthalyma, Olin Microelectronic Materials (United States)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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