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Proceedings Paper

Isolation of novolak resin at low temperature
Author(s): M. Dalil Rahman; Daniel P. Aubin; Dinesh N. Khanna
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Paper Abstract

It is a well known fact that novolak resin undergoes chemical structure changes using vigorous synthesis conditions, such as under high acid catalyst loading and high temperature during isolation. Under such conditions, the structure of novolak resin is rearranged through quinone methide intermediate. We have also observed that the rearranged novolak resin does not perform well in photolithography. In this paper we discus the alternate isolation procedure, eliminating high temperature vacuum distillation. In this process a typical resin synthesis is performed using cresylic acids, catalyst and a solvent with the addition of formaldehyde over time. At the end of the condensation period, distillation is applied using a sub-surface high forced steam. Distillation is performed until all the unreacted cresols are removed. At this point the temperature is raised up to 140 degrees Celsius, and the vacuum is slowly drawn to 35 mm Hg to remove residual water. After the volatiles have been distilled off, the vacuum is released and a solvent is added to adjust the solid content. We discuss in this paper, the properties of the resin in the application of photolithography.

Paper Details

Date Published: 14 June 1996
PDF: 11 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241853
Show Author Affiliations
M. Dalil Rahman, Hoechst Celanese Corp. (United States)
Daniel P. Aubin, Hoechst Celanese Corp. (United States)
Dinesh N. Khanna, Hoechst Celanese Corp. (United States)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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