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Proceedings Paper

Novel alkaline-soluble alicyclic polymer poly(TCDMACOOH) for ArF chemically amplified positive resists
Author(s): Katsumi Maeda; Kaichiro Nakano; Takeshi Ohfuji; Etsuo Hasegawa
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Paper Abstract

We have developed a novel ArF resist polymer poly[carboxy- tricyclo(5.3.2.0)decanylmethyl methacrylate] [poly(TCDMACOOH)], which has a carboxyl substituent on the tricyclodecanyl group. This polymer exhibited good solubility (1.93 micrometer/sec) in a 2.38% TMAH solution, high transparency (70%/micrometer) at 193 nm, and a good dry-etching resistance for CF4 gas (1.2 times the etching rate of novolac resin). Furthermore, the resist composed of the partially protected copolymer poly(TCDMACOOH60-TCDMACOOtBu40) with a photoacid generator exhibits a resolution of 0.18 micrometer L/S using an ArF exposure system (NA equals 0.55).

Paper Details

Date Published: 14 June 1996
PDF: 9 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241836
Show Author Affiliations
Katsumi Maeda, NEC Corp. (Japan)
Kaichiro Nakano, NEC Corp. (Japan)
Takeshi Ohfuji, NEC Corp. (Japan)
Etsuo Hasegawa, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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