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Proceedings Paper

Completely water-processable and other chemically amplified resists from maleic anhydride copolymers
Author(s): Alexander M. Vekselman; Graham D. Darling
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Paper Abstract

A new family of resists is presented that makes possible an all-water (sub)micron scale lithography. It was found by infrared (IR) and thermo-gravimetric analysis (TGA) studies, that polymers with vicinal carboxylic acid moieties undergo thermo-acid-catalyzed dehydration and anhydride formation at a lower temperature, than upon simple uncatalyzed thermolysis. Carboxylic acid moieties allow the use of water for spin-coating, developing, and stripping. For example, ethylene- or methyl vinyl ether-alt-maleic anhydride copolymers with a photo- acid generator can be spin-coated from water to form clear films. Mild heating at 110 - 10 degrees Celsius for 20 - 60 s before and after greater than or equal to 25 mJ/cm2 of UV irradiation, produces a latent image that is developable in water within seconds. Similar acid- catalyzable alcohol elimination was observed with some monoesters, for example poly(styrene- alt-maleic acid monoethyl ester). The difference in reactivity and hydrophobicity between exposed and non-exposed areas also follows functional developing, e.g., the introduction of polyamino compounds or metal ions selectively into non-exposed resist areas.

Paper Details

Date Published: 14 June 1996
PDF: 12 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241827
Show Author Affiliations
Alexander M. Vekselman, McGill Univ. (Canada)
Graham D. Darling, McGill Univ. (Canada)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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