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Proceedings Paper

Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes) containing acetal groups
Author(s): Joo Hyeon Park; Seong-Ju Kim; Ji-Hong Kim; Dong-Chul Seo; Ki-Dae Kim; Sun-Yi Park; Hosull Lee
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Paper Abstract

Fully and partially pendant acetal group substituted polyvinylphenols were synthesized by the methods of free radical polymerization and chemical modification on polyvinylphenol, respectively. The glass transition temperature (Tg) of the partially acetal-substituted polyvinylphenols is in the range of 135 degrees to approximately 148 degrees Celsius, which is enough to overcome the thermal treatments for resist processing. The partially acetal- substituted polyvinylphenols are promising materials for chemically amplified negative tone deep UV photoresist.

Paper Details

Date Published: 14 June 1996
PDF: 9 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241826
Show Author Affiliations
Joo Hyeon Park, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Seong-Ju Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Ji-Hong Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Dong-Chul Seo, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Ki-Dae Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Sun-Yi Park, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Hosull Lee, Korea Kumho Petrochemical Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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