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Proceedings Paper

Characterization of Shipley's positive deep-UV experimental resists: deblocking studies
Author(s): James F. Cameron; Arturo J. Orellana; Martha M. Rajaratnam; Roger F. Sinta
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Paper Abstract

Characterization of the resist chemistry and related processes within several of Shipley's new experimental positive deep UV resists is reported. These resists are unique in that they function by a combination of acid catalyzed deprotection and conversion of a dissolution inhibiting photoacid generator. The resist chemistry is characterized in terms of deblocking efficiency, acid generating efficiency and changes in dissolution rate. In addition, a knowledge of both the deblocking and acid generating efficiency within these resists allowed the catalytic chain length and deprotection volume to be calculated for each resist.

Paper Details

Date Published: 14 June 1996
PDF: 12 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241824
Show Author Affiliations
James F. Cameron, Shipley Co. Inc. (United States)
Arturo J. Orellana, Shipley Co. Inc. (United States)
Martha M. Rajaratnam, Shipley Co. Inc. (United States)
Roger F. Sinta, Shipley Co. Inc. (United States)

Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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