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Proceedings Paper

Manipulation of the thermal properties of positive DUV polymers
Author(s): Roger F. Sinta; George G. Barclay; Timothy G. Adams; David R. Medeiros
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Paper Abstract

The thermal properties of the blocked polymers used in chemically amplified positive DUV photoresists are critical in determining ultimate resist performance as well as in the selection of processing parameters. Recently it has been shown that baking these resists at or above the glass transition temperature (Tg) significantly improves the delay stability of the resist. However in order to utilize this annealing concept two thermal properties, the Tg and the thermal decomposition temperature (Td), of the blocked polymer must be controlled.

Paper Details

Date Published: 14 June 1996
PDF: 11 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241822
Show Author Affiliations
Roger F. Sinta, Shipley Co. Inc. (United States)
George G. Barclay, Shipley Co. Inc. (United States)
Timothy G. Adams, Shipley Co. Inc. (United States)
David R. Medeiros, Univ. of Texas/Austin (United States)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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