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Proceedings Paper

Synthesis and lithographic performance of highly branched polymers from hydroxyphenylmethylcarbinols
Author(s): James R. Sounik; Richard Vicari; Ping-Hung Lu; Elaine Kokinda; Stanley A. Ficner; Ralph R. Dammel
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Paper Abstract

A new synthesis pathway for 4- and 2-hydroxymethylcarbinol (4- and 2-HPMC) has made a new class of highly branched polymers readily available. The polymers, which are isomers of polyhydroxystyrene, show unexpected dissolution behavior in aqueous bases which differs from the solubility characteristics seen for the linear polymers obtained by free-radical polymerization. This behavior is traced back to the influence of the changing bond types in the co-polymerization series on the kinetic parameters. With respect to lithography, the absorption of the polymers is too high to make them attractive as DUV resist materials. Although their bond structure shows all bond types that also exist in novolaks, the HPMC polymers are found to be more PHS-like than novolak-like in their performance with DNQ sensitizers. However, they are compatible with DNQ/novolak resists, and can be used in resin blends with novolaks without phase separation.

Paper Details

Date Published: 14 June 1996
PDF: 12 pages
Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241817
Show Author Affiliations
James R. Sounik, Hoechst Celanese Corp. (United States)
Richard Vicari, Hoechst Celanese Corp. (United States)
Ping-Hung Lu, Hoechst Celanese Corp. (United States)
Elaine Kokinda, Hoechst Celanese Corp. (United States)
Stanley A. Ficner, Hoechst Celanese Corp. (United States)
Ralph R. Dammel, Hoechst Celanese Corp. (United States)


Published in SPIE Proceedings Vol. 2724:
Advances in Resist Technology and Processing XIII
Roderick R. Kunz, Editor(s)

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