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Proceedings Paper

Advancing optical lithography using catadioptric projection optics and step-and-scan
Author(s): Harry Sewell
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Paper Abstract

Resolution requirements of below 200nm require the introduction of high-NA catadioptric projection optics and the development of short-wavelength laser illumination. The numerical aperture (NA) of the projection optics available for step-and-scan lithography has now been increased form 0.5 to 0.6 and KrF excimer-laser illumination introduced. This paper examines the initial performance results achieved using the high-NA (0.6) optics illuminated with a KrF excimer laser. Experimental data, using TDUV-009-PM, TDUV-010-PM, and CGR resists is used to illustrate the performance of 0.5 and 0.6 NA optics. Depth of focus and resolution are measured, and initial optics performance results are provided. The linearity of grouped and isolated line features is used to illustrate the lithographic resolution. Lithographic simulations (PROLITH and SPLAT) are used to show the effects of quadrupole illumination for the enhancement of depth of focus with 200nm lithography. The next generation step-and-scan lithography, which uses ArF (193nm) excimer illumination, is discussed. It is indicated that the step-and-scan technique will allow optical lithography to extend to 180nm resolution and below.

Paper Details

Date Published: 7 June 1996
PDF: 14 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240979
Show Author Affiliations
Harry Sewell, Silicon Valley Group Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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