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Proceedings Paper

Rigorous electromagnetic analysis of aerial image formation in photoresist
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Paper Abstract

A full analysis of the aerial image formation in a photoresist layer is presented. Exact boundary matching of the E-field and H-field at the top and the bottom interfaces of the photoresist allows the exposing intensity distribution inside the photoresist layer to be exactly calculated. Two approximate models for special cases producing simple analytic expressions are also developed. Experimental results are demonstrated by holographic recording of gratings in the photoresist. It is proposed to use such gratings as inexpensive and easily fabricated electron microscope, and microlithographic calibration samples.

Paper Details

Date Published: 7 June 1996
PDF: 12 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240972
Show Author Affiliations
Sergey V. Babin, German Telekom AG (United States)
John T. Sheridan, European Commission Joint Research Ctr. (Italy)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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