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Proceedings Paper

Xe2 excimer lamp (172 nm) for optical lithography
Author(s): Hiroyoshi Tanabe; Yuko Seki; Jun-ichi Yano; Jun Ushioda; Yukio Ogura
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Paper Abstract

A Xe2 excimer lamp (172 nm) has been used for submicrometer patterning of photoresist films. We resolved 0.35 micrometers lines and spaces using a contact printing system. We exposed a chemically amplified photoresist customized for ArF. The sensitivity of the photoresist was 130 mJ/cm$=2) or about ten times smaller than the sensitivity for ArF.

Paper Details

Date Published: 7 June 1996
PDF: 4 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240967
Show Author Affiliations
Hiroyoshi Tanabe, NEC Corp. (Japan)
Yuko Seki, NEC Corp. (Japan)
Jun-ichi Yano, NEC Corp. (Japan)
Jun Ushioda, NEC Corp. (Japan)
Yukio Ogura, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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