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Proceedings Paper

More stable algorithm for rigorous coupled wave analysis applied to topography simulation in optical lithography and its numerical implementation
Author(s): Seung-Gol Lee; Kyung-Il Lee; Jong-Ung Lee; Yongkyoo Choi; Hong-Seok Kim
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Paper Abstract

This paper discusses a more stable algorithm of rigorous coupled wave analysis applicable to 2-D exposure simulation in an optical lithography. This algorithm can resolve a divergence problem inherently and can easily be implemented as a full vector model. 2-D exposure simulator based on this algorithm is developed and applied successfully to a very thick photoresist system. Intensity distributions inside the photoresist are simulated and compared with those of other vector models. The adaptive layering technique is introduced to the simulation of bleaching process in order to reduce the computation time. It is found that the technique can greatly reduce memeory size and computation time with reasonable accuracy.

Paper Details

Date Published: 7 June 1996
PDF: 11 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240966
Show Author Affiliations
Seung-Gol Lee, Inha Univ. (South Korea)
Kyung-Il Lee, Inha Univ. (South Korea)
Jong-Ung Lee, Chongju Univ. (South Korea)
Yongkyoo Choi, LG Semiconductor Co., Ltd. (South Korea)
Hong-Seok Kim, LG Semiconductor Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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