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Proceedings Paper

High-power KrF excimer laser with a solid state switch for microlithography
Author(s): Hakaru Mizoguchi; Noritoshi Ito; Hiroaki Nakarai; Yukio Kobayashi; Yasuo Itakura; Hiroshi Komori; Osamu Wakabayashi; Taketo Aruga; Takashi Sakugawa; Takehisa Koganezawa
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Paper Abstract

New KrF excimer laser for microlithography KLES-G7 with a new simple solid state pulsed power circuit (SPC) is developed. This SPC has several advantages such as less maintenance cost and the higher reliability. The laser realizes 7.5W with 0.8 bandwidth, 600 Hz, 10mJ. The performance and the stability of the laser is demonstrated. The maintenance interval of the SPC is more than 10 X 109 pulse. The KLES-G7 reduces 20 percent of the photon cost compared with the old model. It will accelerate the mass production of after 64Mbit DRAM.

Paper Details

Date Published: 7 June 1996
PDF: 10 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240945
Show Author Affiliations
Hakaru Mizoguchi, Komatsu Ltd. (Japan)
Noritoshi Ito, Komatsu Ltd. (Japan)
Hiroaki Nakarai, Komatsu Ltd. (Japan)
Yukio Kobayashi, Komatsu Ltd. (Japan)
Yasuo Itakura, Komatsu Ltd. (Japan)
Hiroshi Komori, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Taketo Aruga, Komatsu Ltd. (Japan)
Takashi Sakugawa, Meidensha Corp. (Japan)
Takehisa Koganezawa, Meidensha Corp. (Japan)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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