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Proceedings Paper

Focus and exposure dose determination using stepper alignment
Author(s): Peter Dirksen; Rudy J. M. Pellens; Casper A. H. Juffermans; Marijan E. Reuhman-Huisken; Hans van der Laan
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Paper Abstract

The standard ASML alignment system in combination with modified marks is used to determine the primary imaging parameters of the stepper: focus and exposure dose. The method uses a standard chromium on glass reticle. The paper discusses system calibration and feedforward process control in production. A lens qualification at the specified resolution and swing curves are shown. The exposure dose measurements are compared with dose to clear measurements. The theory for optimizing the mark layout is presented.

Paper Details

Date Published: 7 June 1996
PDF: 10 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240941
Show Author Affiliations
Peter Dirksen, Philips Research Labs. (Netherlands)
Rudy J. M. Pellens, Philips Research Labs. (Netherlands)
Casper A. H. Juffermans, Philips Research Labs. (Netherlands)
Marijan E. Reuhman-Huisken, ASM Lithography (Netherlands)
Hans van der Laan, ASM Lithography (Netherlands)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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