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Proceedings Paper

Lithographic lens testing: analysis of measured aerial images, interferometric data, and photoresist measurements
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Paper Abstract

This paper shows and discusses the use of direct aerial image measurements and optical interferometry for the evaluation of advanced i-line lenses. These measurement techniques provide direct information on the image forming capabilities of a stepper lens such that assessments of field curvature, astigmatism and image asymmetry can readily be accomplished. The interaction with the photoresist is shown by directly using the measured aerial image and aberration data into photoresist modeling programs such as Prolith/2 and Solid-C. The link between the optical measurements and the photoresist processes is further established by a comparison of simulated and measured results.

Paper Details

Date Published: 7 June 1996
PDF: 11 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240940
Show Author Affiliations
Donis G. Flagello, ASM Lithography (United States)
Bernd Geh, Carl Zeiss (United States)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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