Share Email Print
cover

Proceedings Paper

Micrascan III: 0.25-um resolution step-and-scan system
Author(s): David M. Williamson; James A. McClay; Keith W. Andresen; Gregg M. Gallatin; Marc D. Himel; Jorge Ivaldi; Christopher J. Mason; Andrew W. McCullough; Charles Otis; John J. Shamaly; Carol Tomczyk
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Catadioptric step-and-scan lithography offers specific advantages over step-and-repeat all- refractive (dioptric) systems as resolution requirements drive to 0.25micrometers in volume production. For the Micrascan family of step-and-scan tools this step in the evolutionary path from 0.35micrometers to 0.25micrometers has involved changes to both the projection optics and illumination system.

Paper Details

Date Published: 7 June 1996
PDF: 7 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240939
Show Author Affiliations
David M. Williamson, Silicon Valley Group Lithography Systems, Inc. (United States)
James A. McClay, Silicon Valley Group Lithography Systems, Inc. (United States)
Keith W. Andresen, Silicon Valley Group Lithography Systems, Inc. (United States)
Gregg M. Gallatin, Silicon Valley Group Lithography Systems, Inc. (United States)
Marc D. Himel, Silicon Valley Group Lithography Systems, Inc. (United States)
Jorge Ivaldi, Silicon Valley Group Lithography Systems, Inc. (United States)
Christopher J. Mason, Silicon Valley Group Lithography Systems, Inc. (United States)
Andrew W. McCullough, Silicon Valley Group Lithography Systems, Inc. (United States)
Charles Otis, Silicon Valley Group Lithography Systems, Inc. (United States)
John J. Shamaly, Silicon Valley Group Lithography Systems, Inc. (United States)
Carol Tomczyk, Silicon Valley Group Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

© SPIE. Terms of Use
Back to Top