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Proceedings Paper

KrF step-and-scan exposure system using higher-NA projection lens
Author(s): Kazuaki Suzuki; Shinji Wakamoto; Kenji Nishi
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Paper Abstract

A KrF step and scan exposure system using a projection lens has been developed. The exposure field is 25mm by 33mm which is large enough to fit two 256Mbit DRAM chips. The maximum numerical aperture is 0.6 and the maximum coherence factor of the illumination system is 0.75 for the maximum numerical aperture. Original design concepts for scanning technologies are introduced. Actual data of the system indicate the sufficient performance for 250nm design rule device production.

Paper Details

Date Published: 7 June 1996
PDF: 13 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240938
Show Author Affiliations
Kazuaki Suzuki, Nikon Corp. (Japan)
Shinji Wakamoto, Nikon Corp. (Japan)
Kenji Nishi, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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