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Proceedings Paper

Stepper exposure system for the quarter-micrometer age
Author(s): Hirohiko Shinonaga; Mikio Arakawa
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Paper Abstract

We at Canon are ready to offer three types of steppers as a solution of 0.25micrometers age photolithography. The feature summary of the respective steppers are shown. These three steppers share the same body structure and software platform for perfect mix and match usage. The combination of these three systems should allow the chip manufacturers to achieve the most cost effective 0.25 micrometers ULSI mass production. This paper focuses on the following two points: (1) the outcome of the performance on the new KrF laser based exposure system (FPA-3000EX3); (2) overlay experimental results (mix and match with FPA-3000i4 and FPA- 3000iW). The FPA-3000 EX3 is a newly introduced KrF laser based stepper for 0.25micrometers resolution, having a high numerical aperture and wide image field. The basic printing performance of the system, such as DOF and CD LINEARITY are explained in this paper. The cost effective production, with the mix and match of the lithographic tools, is becoming more important in the 0.25micrometers age. The performance of the high throughput stepper, FPA-3000iW is discussed from the viewpoint of mix and match with critical layer steppers.

Paper Details

Date Published: 7 June 1996
PDF: 13 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240937
Show Author Affiliations
Hirohiko Shinonaga, Canon Inc. (Japan)
Mikio Arakawa, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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