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Proceedings Paper

Optimization of stepper parameters and their influence on OPC
Author(s): Rakesh R. Vallishayee; Steven A. Orszag; Eytan Barouch
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Paper Abstract

An algorithm for the optimization of stepper parameters has been designed and implemented. The cost function used in this optimization is the contrast. The aerial image is computed using the computer code FAIM. First, the contrast of the image is calculated and the derivatives of the contrast with respect to the stepper parameters are evaluated. The computational cost of these calculations is only slightly more than that of one aerial image simulation. A conjugate gradient type algorithm is then used to obtain the minimum of the contrast.

Paper Details

Date Published: 7 June 1996
PDF: 10 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240931
Show Author Affiliations
Rakesh R. Vallishayee, Princeton Univ. (United States)
Steven A. Orszag, Princeton Univ. (United States)
Eytan Barouch, Boston Univ. (United States)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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