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Proceedings Paper

Fast and accurate optical proximity correction based on aerial image simulation
Author(s): Tetsuro Hanawa; Kazuya Kamon; Akihiro Nakae; Shuji Nakao; Koichi Moriizumi
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Paper Abstract

Because optical lithography requires precise CD control, we developed a fast, accurate proximity correction method based on aerial image simulation. Simple formulas using a linear combination of simulated aerial image intensities both at and around mask edge were found effective for fast, precise CD prediction. Using the developed CD prediction and the fine biasing correction methods, we verified that various two-dimensional patterns printed by an i- line stepper using modified illumination and binary intensity mask are satisfactorily corrected; i.e., CD deviations from designed values, line shortening and feature deformations are effectively reduced.

Paper Details

Date Published: 7 June 1996
PDF: 11 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240929
Show Author Affiliations
Tetsuro Hanawa, Mitsubishi Electric Corp. (Japan)
Kazuya Kamon, Mitsubishi Electric Corp. (Japan)
Akihiro Nakae, Mitsubishi Electric Corp. (Japan)
Shuji Nakao, Mitsubishi Electric Corp. (Japan)
Koichi Moriizumi, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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