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Proceedings Paper

Measurement of microlithography aerial image quality
Author(s): Joseph P. Kirk; Timothy A. Brunner
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Paper Abstract

The aerial image formed by a microlithography lens places fundamental limits on the size and density of patterns that are manufactured by that lens. In the past, the lithographer was unable to directly measure the dose distribution in this aerial image. Highly absorbing photoresists have continuous tone relief response to dose variations and this relief is a record of the dose distribution in an image. It is shown how high resolution measurement of that relief by an atomic force microprobe gives the lithographer a sampling of the spatial distribution of dose within the image.

Paper Details

Date Published: 7 June 1996
PDF: 7 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240915
Show Author Affiliations
Joseph P. Kirk, IBM Microelectronics Div. (United States)
Timothy A. Brunner, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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