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Proceedings Paper

Effects of radially nonsymmetric pupil filters and multiple-pupil exposure
Author(s): Rudolf M. von Buenau; Hiroshi Fukuda; Tsuneo Terasawa
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Paper Abstract

In this paper, we discuss the effects of radially non-symmetric pupil filters on patterns containing only horizontal and vertical edges. Specifically, we point out that four-fold symmetry of the imaging properties can be achieved through multiple exposure of the same pattern with pupil functions that are either symmetric or anti-symmetric about two orthogonal axes. We show that such pupil functions can be sued to decrease the minimum feature size for certain bright field patterns and increase the corner sharpness for dark field patterns. We also briefly discuss the practical implementation of this multiple-pupil approach.

Paper Details

Date Published: 7 June 1996
PDF: 11 pages
Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240911
Show Author Affiliations
Rudolf M. von Buenau, Hitachi Ltd. (Japan)
Hiroshi Fukuda, Hitachi Ltd. (Japan)
Tsuneo Terasawa, Hitachi Ltd. (Japan)


Published in SPIE Proceedings Vol. 2726:
Optical Microlithography IX
Gene E. Fuller, Editor(s)

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