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Proceedings Paper

Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3
Author(s): Lolita G. Rotkina; N. A. Kaliteevskaia; Ruben P. Seisyan; D. V. Smirnov; S. Babushkin; M. A. Vasilevsky
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Paper Details

Date Published: 27 May 1996
PDF: 4 pages
Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); doi: 10.1117/12.240483
Show Author Affiliations
Lolita G. Rotkina, A.F. Ioffe Physical-Technical Institute (Russia)
N. A. Kaliteevskaia, A.F. Ioffe Physical-Technical Institute (Russia)
Ruben P. Seisyan, A.F. Ioffe Physical-Technical Institute (Russia)
D. V. Smirnov, A.F. Ioffe Physical-Technical Institute (Russia)
S. Babushkin, D.F. Efremov Science-Research Institute of Electro-Physical Equipment (Russia) (Russia)
M. A. Vasilevsky, D.F. Efremov Science-Research Institute of Electro-Physical Equipment (Russia) (Russia)


Published in SPIE Proceedings Vol. 2723:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
David E. Seeger, Editor(s)

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