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Proceedings Paper

New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile
Author(s): Oleg A. Makarov; Zheng Chen; Azalia A. Krasnoperova; Franco Cerrina; Vadim V. Cherkashin; Alexander G. Poleshchuk; Voldemar Petrovich Koronkevich
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Paper Abstract

The use of the X-ray lithography to produce blazed diffractive optical elements (DOEs) is described. The proposed method allows one to make highly efficient blazed DOE with a deep phase profile (ten wavelengths and more) using a single X-ray mask with a binary transmission pattern. Unlike the well-known multilevel DOEs, blazed ones do not involve fabrication and aligning of a set of masks. DOEs with a profile depth of 10 micrometers and more and zone sizes of down to 1 micrometers can be obtained due to the short wavelength and high penetrability of X- rays. The first experimental samples of blazed DOEs with a 10 micrometers -height profile (lenses and gratings) were fabricated by X-ray lithography with synchrotron radiation using the X-ray masks, prepared in accordance with the pulse-width modulation algorithm. Diffraction efficiency for lenses was measured for white light. It is higher than 80 percent for the central part of the lenses (inside a 10 mm diameter) and about 60 percent for an area of 20 mm diameter.

Paper Details

Date Published: 27 May 1996
PDF: 7 pages
Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); doi: 10.1117/12.240477
Show Author Affiliations
Oleg A. Makarov, Argonne National Lab. (United States)
Zheng Chen, Univ. of Wisconsin/Madison (United States)
Azalia A. Krasnoperova, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)
Vadim V. Cherkashin, Institute of Automation and Electrometry (Russia)
Alexander G. Poleshchuk, Institute of Automation and Electrometry (Russia)
Voldemar Petrovich Koronkevich, Institute of Automation and Electrometry (Russia)


Published in SPIE Proceedings Vol. 2723:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
David E. Seeger, Editor(s)

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