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Proceedings Paper

UV-laser investigation of dielectric thin films
Author(s): K. Ettrich; Holger Blaschke; Eberhard Welsch; Peter Thomsen-Schmidt; Dieter Schaefer
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Paper Abstract

Utilizing thermal Mirage technique, UV laser damage resistivity studies on LaF3/MgF2, Al2O3/SiO2, and HfO2/SiO2 multilayer stacks have been performed at (lambda) equals 248 nm, (tau) equals 20 ns. Investigating these stacks by changing the number of (HL) pairs and the substrate material, optical and thermal coating properties were shown to be responsible for UV single-shot laser damage. Similarly, the damage threshold of selected samples is to be influenced by the deposition technique. Furthermore, multishot damage measurements on LaF3/MgF2 high-reflecting multilayer coatings reveal the accumulation of laser energy in the predamage range.

Paper Details

Date Published: 27 May 1996
PDF: 14 pages
Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240407
Show Author Affiliations
K. Ettrich, Friedrich-Schiller-Univ. Jena (Germany)
Holger Blaschke, Friedrich-Schiller-Univ. Jena (Germany)
Eberhard Welsch, Friedrich-Schiller-Univ. Jena (Germany)
Peter Thomsen-Schmidt, Berliner Institut fuer Optik GmbH (Germany)
Dieter Schaefer, Berliner Institut fuer Optik GmbH (Germany)


Published in SPIE Proceedings Vol. 2714:
27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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