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Proceedings Paper

Ultrashort-pulse optical damage
Author(s): Brent C. Stuart; Michael D. Feit; Steve M. Herman; Alexander M. Rubenchik; Bruce W. Shore; Michael D. Perry
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Paper Abstract

Advances in high peak power short-pulse laser systems are currently limited by laser-induced damage to optical components by the intense short pulses. We have investigated the damage thresholds and mechanisms of pure dielectrics, and gold and multilayer-dielectric mirrors and diffraction gratings, with pulses ranging from 1 ns down to 0.1 ps. Theoretical modeling of the damage process is in quantitative agreement with measurements for both metals and dielectrics. In the dielectrics, we find a change in pulse width scaling of the threshold fluence near 20 ps, below which the excited electrons generated by multiphoton and avalanche ionization have insufficient time to couple their energy to the lattice during the pulse. For the shortest pulses the damage process becomes dominated by multiphoton ionization, leading to a very strong dependence on the electric field strength (extremely localized ablation) and a relative insensitivity to sample defects.

Paper Details

Date Published: 27 May 1996
PDF: 14 pages
Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240404
Show Author Affiliations
Brent C. Stuart, Lawrence Livermore National Lab. (United States)
Michael D. Feit, Lawrence Livermore National Lab. (United States)
Steve M. Herman, Lawrence Livermore National Lab. (United States)
Alexander M. Rubenchik, Lawrence Livermore National Lab. (United States)
Bruce W. Shore, Lawrence Livermore National Lab. (United States)
Michael D. Perry, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 2714:
27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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