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Proceedings Paper

Absorption and laser damage threshold studies of ion-assisted pulsed-laser-deposited oxide films
Author(s): Guenter Reisse; Steffen Weissmantel; Bernd Keiper; Bernhard Steiger; Ulrike Broulik
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Paper Abstract

The laterally resolved absorption and the laser damage thresholds at 1.06 micrometers wavelength of yttria and hafnia films prepared by pulsed laser deposition with oxygen ion bombardment of the growing films were investigated. Depending on the laser and ion beam parameters films with low average absorption can be prepared by that method. Consequently, high predominantly intrinsic absorption induced laser damage thresholds D1 comparable with those of continuously evaporated films can be prepared. The more defect induced laser damage thresholds D0, however, are largely determined by a certain number of micron- sized particulates embedded inside the films. Their number can be reduced by optimizing the laser pulse power density and the laser beam cross-section on the target, while their influence on laser damage thresholds can be reduced by increasing the ratio of oxygen ion bombardment to growth rate.

Paper Details

Date Published: 27 May 1996
PDF: 10 pages
Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240375
Show Author Affiliations
Guenter Reisse, Hochschule fuer Technik und Wirtschaft Mittweida (Germany)
Steffen Weissmantel, Hochschule fuer Technik und Wirtschaft Mittweida (Germany)
Bernd Keiper, Hochschule fuer Technik und Wirtschaft Mittweida (Germany)
Bernhard Steiger, Hochschule fuer Technik und Wirtschaft Mittweida (Germany)
Ulrike Broulik, Hochschule fuer Technik und Wirtschaft Mittweida (Germany)


Published in SPIE Proceedings Vol. 2714:
27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995
Harold E. Bennett; Arthur H. Guenther; Mark R. Kozlowski; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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