Share Email Print
cover

Proceedings Paper

International comparison of photomask linewidth standards: United States (NIST) and United Kingdom (NPL)
Author(s): James E. Potzick; John W. Nunn
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards organizations of several countries. These standards are often in the form of chrome-on-quartz photomasks with a variety of linewidth, spacewidth, and pitch patterns. The British and U.S. national laboratories have made comparative measurements of linewidth, spacewidth, and pitch on two national photomask linewidth standards in order to detect any systematic differences between their respective calibration systems. The measurement differences were all found to be within the calibration expanded uncertainties of both laboratories combined, and are not significant at the 95% confidence level.

Paper Details

Date Published: 21 May 1996
PDF: 6 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240148
Show Author Affiliations
James E. Potzick, National Institute of Standards and Technology (United States)
John W. Nunn, National Physical Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

© SPIE. Terms of Use
Back to Top