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Proceedings Paper

Efficient workstation-based 3D model for optical alignment simulation
Author(s): Kevin D. Lucas; Chi-Min Yuan; Andrzej J. Strojwas
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Paper Abstract

A new workstation-based rigorous 3D model for simulation of light scattering by alignment structures is introduced. The model extends a successful 2D lithography model, and has been applied to the simulation of periodic 3D alignment marks on a resist covered silicon substrate. The theory behind the new model is presented, and examples are given of the model's results and computational efficiency.

Paper Details

Date Published: 21 May 1996
PDF: 12 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240139
Show Author Affiliations
Kevin D. Lucas, Motorola (United States)
Chi-Min Yuan, Motorola (United States)
Andrzej J. Strojwas, Carnegie Mellon Univ. (United States)


Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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