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Proceedings Paper

Benefits applications and data analysis techniques for linewidth multilevel experimental design
Author(s): Anthony Barbieri
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Paper Abstract

In contrast to other experimental methods which have just two or three settings per variable, the rationale is presented for using a large number of stepper exposures at poly or active area for certain applications (such as obtaining high correlation to E-TEST variables). How variables (which are dependent on linewidth) relate to each other can also be determined to high correlation; even linear correlation of measured poly linewidth to speed had an R2 value of 0.96. This experimental method is useful for numerous applications such as: process characterization, budgeting of CD linewidths, and correlating process variables to electrical data. Useful data analysis techniques are also shown. The experimental method is also cost- effective, requiring a small number of wafers.

Paper Details

Date Published: 21 May 1996
PDF: 7 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240129
Show Author Affiliations
Anthony Barbieri, Digital Equipment Corp. (United States)


Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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