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Proceedings Paper

Scanning optical microscope integrated in a wafer stepper for image sensing
Author(s): Manfred G. Tenner
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Paper Abstract

Latent image phase gratings can be used for alignment purposes and monitoring the performance of wafer steppers. Scanning optical microscopy is a sensitive method to measure the phase contrast as well as the reflectivity contrast of such gratings. The contrast depends on the conversion of the photo active component in the photo resist. Therefore, parameters influencing this conversion, such as focussing conditions, exposure dose, and the efficiency of coupling light into the photo resist, can be monitored. Examples of measuring best focus, the rate constant of the conversion for the photo active component, and the exposure dose dependence of the photo resist are presented. In light of its excellent performance a scanning optical microscope integrated in a wafer stepper is a useful tool in monitoring the lithographic process.

Paper Details

Date Published: 21 May 1996
PDF: 7 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240116
Show Author Affiliations
Manfred G. Tenner, Philips Research Labs. (Netherlands)


Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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