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Proceedings Paper

Nanometer-scale dimensional metrology with noncontact atomic force microscopy
Author(s): Herschel M. Marchman
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Paper Abstract

Results from an extensive performance study on a noncontact scanning mode atomic fore microscope (AFM) are presented. The application of AFM to complement in-line CD metrology SEMs also is described.

Paper Details

Date Published: 21 May 1996
PDF: 13 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240110
Show Author Affiliations
Herschel M. Marchman, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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