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Proceedings Paper

Removal of process-generated organic impurities from recycled water in semiconductor fabs
Author(s): G. Chen; Farhang Shadman
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Paper Abstract

Oxidation is one of the most effective ways of removing organic impurities from water or recycled waste water. The kinetics and the mechanism of oxidation of two types of organic impurities were studied: soluble but recalcitrant organic impurities and the organic particles such as photo-resists, entering the recycle streams. The UV photolysis and photocatalytic oxidation of organic impurities in ultrapure water were studied in a pilot ultrapure water plant. A novel photocatalytic filter was developed by depositing a layer of photocatalytically active material on an inorganic filter substrate. A number of naturally accruing soluble and particulate organic impurities as well as surfactants were used as model impurities in this study. The photocatalyst enhanced the oxidation by both increasing the adsorption on the filter and enhancing the oxidation reaction through the catalyzed formation of active radicals.

Paper Details

Date Published: 21 May 1996
PDF: 8 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240091
Show Author Affiliations
G. Chen, Univ. of Arizona/Tuscon (United States)
Farhang Shadman, Univ. of Arizona/Tuscon (United States)


Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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