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Proceedings Paper

SEM characterization of etch and develop contributions to poly-CD error
Author(s): Crid Yu; Anna Maria Minvielle; Costas J. Spanos
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Paper Abstract

CD variability is usually managed using an error budget, which apportions the total allowable error into individual process components. Automated SEM metrology can provide high quantities of samples at intermediate points in a process sequence and can be used to estimate error budget items. However, evidence suggests that SEM CD measurements can be tainted by sequencing artifacts such as trend and autocorrelation. A methodology is developed to characterize the CD variability introduced by automated SEM measurements and remove them through statistical filtering. This technique is applied to estimate variability after resist development.

Paper Details

Date Published: 21 May 1996
PDF: 4 pages
Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240081
Show Author Affiliations
Crid Yu, Univ. of California/Berkeley (United States)
Anna Maria Minvielle, Advanced Micro Devices, Inc. (United States)
Costas J. Spanos, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 2725:
Metrology, Inspection, and Process Control for Microlithography X
Susan K. Jones, Editor(s)

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