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Proceedings Paper

One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask
Author(s): Walter Daschner; Robert D. Stein; Pin Long; Chuck Wu; Sing H. Lee
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Paper Abstract

Micro-optics such as diffractive optics and computer generated holograms are essential components for modern optical design. To reduce their unit fabrication cost we describe a method of reproducing micro-optics in quantities. A true gray-level mask was fabricated in High Energy Beam Sensitive (HEBS)-Glass by means of a single e-beam direct write step. This gray-level mask was used in a optical contact aligner to print a multilevel Diffractive Optical Element (DOE) in a single optical exposure. A chemically assisted ion beam etching process has been used to transfer the DOE structure from the resist into the substrate.

Paper Details

Date Published: 7 May 1996
PDF: 3 pages
Proc. SPIE 2689, Diffractive and Holographic Optics Technology III, (7 May 1996); doi: 10.1117/12.239618
Show Author Affiliations
Walter Daschner, Univ. of California/San Diego (United States)
Robert D. Stein, Univ. of California/San Diego (United States)
Pin Long, Univ. of California/San Diego (United States)
Chuck Wu, Canyon Materials, Inc. (United States)
Sing H. Lee, Univ. of California/San Diego (United States)


Published in SPIE Proceedings Vol. 2689:
Diffractive and Holographic Optics Technology III
Ivan Cindrich; Sing H. Lee, Editor(s)

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