Share Email Print

Proceedings Paper

Effect of p-doping profile on performance of strained multiquantum well InGaAsP/InP lasers
Author(s): Gregory L. Belenky; C. Lewis Reynolds Jr.; Rudolf F. Kazarinov; Venkat S. Swaminathan; Serge Luryi; John Lopata
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Leakage of electrons from the active region of InGaAs/InP laser heterostructures with different profiles of acceptor doping was measured by a purely electrical technique together with the device threshold current. Comparison of the obtained results with modeling data and SIMS analysis shows that carrier leakage of electrons over the heterobarrier depends strongly on the profile of p-doping and level of injection. In the case of a structure with an undoped p- cladding/waveguide interface the value of electron leakage current can reach 20% of the total pumping current at an injection current density of 10 kA/cm2 at 50 C. It is shown that carrier leakage in InGaAsP/InP multi-quantum-well lasers can be minimized and the device performance improved by utilizing a p-doped SCH layer.

Paper Details

Date Published: 1 May 1996
PDF: 10 pages
Proc. SPIE 2693, Physics and Simulation of Optoelectronic Devices IV, (1 May 1996); doi: 10.1117/12.238996
Show Author Affiliations
Gregory L. Belenky, AT&T Bell Labs. and SUNY/Stony Brook (United States)
C. Lewis Reynolds Jr., AT&T Bell Labs. (United States)
Rudolf F. Kazarinov, AT&T Bell Labs. (United States)
Venkat S. Swaminathan, AT&T Bell Labs. (United States)
Serge Luryi, SUNY/Stony Brook (United States)
John Lopata, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 2693:
Physics and Simulation of Optoelectronic Devices IV
Weng W. Chow; Marek Osinski, Editor(s)

© SPIE. Terms of Use
Back to Top