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Proceedings Paper

UV FEL light source for industrial processing
Author(s): Michael J. Kelley; H. Frederick Dylla; George R. Neil; Leonard J. Brillson; Daniel P. Henkel; Henry Helvajian
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Paper Abstract

Short-wavelength UV light is strongly absorbed by most materials, creating the opportunity to drive near-surface thermal or chemical processes. The resulting modifications have a wide range of prospective applications, but few have been developed because of the low capacity and high unit cost of light from present sources. We analyze the light source requirements for large-scale applications to polymers and metals. We describe meeting them with free electron laser whose design is described in a companion paper in this session. This machine will deliver 1.0 to 2.5 kW between 190 nm and 350 nm with options in the visible and IR, and serve to further develop FEL technology for much higher powered machines. We gratefully acknowledge support for this work from the Commonwealth of Virginia Center for Innovative Technologies and The U.S. Department of Energy.

Paper Details

Date Published: 8 April 1996
PDF: 6 pages
Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); doi: 10.1117/12.237725
Show Author Affiliations
Michael J. Kelley, E. I. DuPont de Nemours & Co., Inc. (United States)
H. Frederick Dylla, CEBAF (United States)
George R. Neil, CEBAF (United States)
Leonard J. Brillson, Xerox Webster Research Ctr. (United States)
Daniel P. Henkel, Henkel Metallurgical Technologies (United States)
Henry Helvajian, The Aerospace Corp. (United States)

Published in SPIE Proceedings Vol. 2703:
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics
Jan J. Dubowski; Jyotirmoy Mazumder; Leonard R. Migliore; Chandrasekhar Roychoudhuri; Ronald D. Schaeffer, Editor(s)

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