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Proceedings Paper

Proposed high-power UV industrial demonstration laser at CEBAF
Author(s): Stephen V. Benson; Joseph J. Bisognano; Courtlandt L. Bohn; Larry Cardman; William B. Colson; Paul C. Davidson; David Douglas; H. Frederick Dylla; David Engwall; Jock Fugitt; John C. Goldstein; Kevin Jordan; David Kehne; Zhenghai Li; Hong-Xiu Liu; Lia Merminga; George R. Neil; David Neuffer; Michelle D. Shinn; Mark Wiseman; Robert K. Wong
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Paper Abstract

The Laser Processing Consortium, a collaboration of industries, universities, and the Continuous Electron Accelerator Facility in Newport News, Virginia, has proposed building a demonstration industrial processing laser for surface treatment and micro-machining The laser is a free-electron laser with average power output exceeding 1 kW in the ultraviolet. The design calls for a novel driver accelerator that recovers most of the energy of the exhaust electron beam to produce laser light with good wall-lug efficiency. The laser and accelerator design use technologies that are scalable to much higher power. We will describe the critical design issues in the laser such as the stability, power handling, and losses of the optical resonator, and the quality, power, and reliability of the electron beam. We will also describe the calculated laser performance. Finally progress to date on accelerator development and resonator modeling will be reported.

Paper Details

Date Published: 8 April 1996
PDF: 9 pages
Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); doi: 10.1117/12.237714
Show Author Affiliations
Stephen V. Benson, CEBAF (United States)
Joseph J. Bisognano, CEBAF (United States)
Courtlandt L. Bohn, CEBAF (United States)
Larry Cardman, CEBAF (United States)
William B. Colson, Naval Postgraduate School (United States)
Paul C. Davidson, CEBAF (United States)
David Douglas, CEBAF (United States)
H. Frederick Dylla, CEBAF (United States)
David Engwall, Univ. of Illinois/Urbana-Champaign (United States)
Jock Fugitt, CEBAF (United States)
John C. Goldstein, Los Alamos National Lab. (United States)
Kevin Jordan, CEBAF (United States)
David Kehne, CEBAF (United States)
Zhenghai Li, Stanford Univ. (United States)
Hong-Xiu Liu, CEBAF (United States)
Lia Merminga, CEBAF (United States)
George R. Neil, CEBAF (United States)
David Neuffer, CEBAF (United States)
Michelle D. Shinn, CEBAF (United States)
Mark Wiseman, CEBAF (United States)
Robert K. Wong, Naval Postgraduate School (United States)


Published in SPIE Proceedings Vol. 2703:
Lasers as Tools for Manufacturing of Durable Goods and Microelectronics
Jan J. Dubowski; Jyotirmoy Mazumder; Leonard R. Migliore; Chandrasekhar Roychoudhuri; Ronald D. Schaeffer, Editor(s)

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